<--- Back to Details
First PageDocument Content
Molecular beam epitaxy / Semiconductor growth / Chemistry / Surface diffusion / Kinetic Monte Carlo / Stranski–Krastanov growth / Physics / Science / Materials science / Thin film deposition / Statistical mechanics
Date: 2004-05-12 01:29:30
Molecular beam epitaxy
Semiconductor growth
Chemistry
Surface diffusion
Kinetic Monte Carlo
Stranski–Krastanov growth
Physics
Science
Materials science
Thin film deposition
Statistical mechanics

Competing roughening mechanisms in strained heteroepitaxy: a fast kinetic Monte Carlo study Chi-Hang Lam1 , Chun-Kin Lee1 , and Leonard M. Sander2 1 arXiv:cond-mat[removed]v2 5 Jul 2002

Document is deleted from original location.
Use the Download Button below to download from the Web Archive.

Download Document from Web Archive

File Size: 169,06 KB