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Statistics / Technology / Surface micromachining / Standard deviation / Microelectromechanical systems / Etching / Polycrystalline silicon / Resist / Chemical-mechanical planarization / Materials science / Microtechnology / Semiconductor device fabrication


SUMMiT V Five Level Surface Micromachining Technology Design Manual Version 3.2 – October 25, 2012 MEMS Technologies Department Microelectronics Development Laboratory
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Document Date: 2013-04-09 15:47:51

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City

SPIE / Albuquerque / /

Company

Lockheed Martin Corporation / Sandia National Laboratories / Sandia Corporation / /

Currency

pence / /

/

Event

FDA Phase / /

Facility

bar Pooled StDev / /

IndustryTerm

metal layer / patterned metal layer / owned subsidiary / layout tool / chemical mechanical polishing / planarized using a chemical mechanical polishing / /

Organization

U.S. Department of Energy’s National Nuclear Security Administration / International Society for Optical Engineering / /

Position

designer / /

Product

SACOX1 / /

ProvinceOrState

New Mexico / /

PublishedMedium

Proceedings of SPIE / /

Technology

chemical mechanical polishing / MEMS Technology / lithography / MEMS / 2012 MEMS Technologies / Five Level Surface Micromachining Technology / dielectric / CMP / /

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