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Semiconductor device fabrication / Chemistry / Nanoimprint lithography / Photolithography / Photoresist / Phase-shift mask / Resist / Etching / Talbot effect / Materials science / Microtechnology / Technology


Fabrication of phase shifting masks with TM nanoimprint lithography for PHABLE photolithography Christian Daisa, Francis Clubea,b, Harun H. Solaka, Konrad Vogelsangb, Helmut Schiftb a Eulitha AG, 5232 Villigen PSI, Switz
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Document Date: 2014-05-05 05:15:37

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File Size: 3,03 MB

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Currency

pence / /

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Facility

Paul Scherrer Institute / /

IndustryTerm

photolithographic technology / e-beam / /

Organization

Paul Scherrer Institute / /

Person

Christian Daisa / Talbot Lithography / Francis Clubea / Harun H. Solaka / Helmut Schiftb / Konrad Vogelsangb / /

ProgrammingLanguage

NIL / /

PublishedMedium

Optics Express / /

Technology

laser / photolithography / lithography / /

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