<--- Back to Details
First PageDocument Content
Chemical elements / Coatings / Electronics manufacturing / Solder / Plating / Tin / Terne / Titanium nitride / Copper / Chemistry / Matter / Manufacturing
Date: 2014-04-24 06:33:32
Chemical elements
Coatings
Electronics manufacturing
Solder
Plating
Tin
Terne
Titanium nitride
Copper
Chemistry
Matter
Manufacturing

Microsoft Word - 01045_E_Stripper_L_80_korrigiert

Add to Reading List

Source URL: www.schloetter.de

Download Document from Source Website

File Size: 38,20 KB

Share Document on Facebook

Similar Documents

Semiconductor device fabrication / Chemistry / Matter / Manufacturing / Thin film deposition / Atomic layer deposition / Titanium dioxide / Chemical vapor deposition / Diffusion barrier / Thin film / Titanium nitride / Crystalline silicon

Journal of Undergraduate Research 4, Selective Atomic Layer Deposition (SALD) of Titanium Dioxide on Silicon and Copper Patterned Substrates K. Overhage Department of Chemical Engineering, Purdue University, I

DocID: 1qbWG - View Document

Nitrides / Superhard materials / Metal plating / Chemical elements / Native element minerals / Plating / Silicon nitride / Nanocomposite / Nickel / Titanium nitride / Metal matrix composite / Silicon

MATEC Web of Conferences 30, DOI: m atec conf 0 5  C Owned by the authors, published by EDP Sciences, 2015 Effect of Silicon Nitride Incorporation on Microstructure and Hardne

DocID: 1puXB - View Document

Semiconductor device fabrication / Metallurgy / Superalloy / Thin film deposition / Thin film / Titanium nitride / Ceramic / Turbine blade

http://labmat.prz.edu.pl Advanced Technologies for Aerospace Industry Paweł Rokicki,

DocID: 1pmbe - View Document

Semiconductor device fabrication / Thin film deposition / Materials science / Atomic layer deposition / Electrical resistivity and conductivity / Plasma / Coating / Titanium nitride / Polycrystalline silicon / Chemical vapor deposition

MATEC Web of Conferences 39 , ) DOI: m atecconf1 0  C Owned by the authors, published by EDP Sciences, 2016 Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the

DocID: 1p7X8 - View Document

Thin film deposition / Semiconductor device fabrication / Vacuum / Coatings / Plasma processing / Atomic layer deposition / Vacuum deposition / Thin film / Chemical vapor deposition / CVD / Titanium nitride

FACULTY: FIELD OF STUDY: COURSE TITLE: LECTURER’S NAME: E-MAIL ADDRESS OF THE LECTURER: ECTS POINTS FOR THE COURSE:

DocID: 1oD9t - View Document