Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409

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Date: 2009-11-24 11:31:03 Thin film deposition Semiconductor device fabrication Atomic layer deposition Matter Manufacturing Chemistry Thin film ALD Vacuum deposition		Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409 Add to Reading List Source URL: jur.phy.uic.edu Download Document from Source Website File Size: 651,66 KB Share Document on Facebook