Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409 - Vacuum deposition - Document - PDFSEARCH.IO

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	Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409 Add to Reading List Document Date: 2009-11-24 11:31:03 Open Document File Size: 651,66 KB Share Result on Facebook

Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409Add to Reading List