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Technology / Chemical vapor deposition / Coatings / Plasma processing / Semiconductor device fabrication / Thin film deposition / Wire / Pressure measurement / Field electron emission / Vacuum / Physics / Measurement
Date: 2007-07-14 19:13:41
Technology
Chemical vapor deposition
Coatings
Plasma processing
Semiconductor device fabrication
Thin film deposition
Wire
Pressure measurement
Field electron emission
Vacuum
Physics
Measurement

JOURNAL OF APPLIED PHYSICS VOLUME 92, NUMBER 8 15 OCTOBER 2002

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