Back to Results
First PageMeta Content
Technology / Chemical vapor deposition / Coatings / Plasma processing / Semiconductor device fabrication / Thin film deposition / Wire / Pressure measurement / Field electron emission / Vacuum / Physics / Measurement


JOURNAL OF APPLIED PHYSICS VOLUME 92, NUMBER 8 15 OCTOBER 2002
Add to Reading List

Document Date: 2007-07-14 19:13:41

Open Document

File Size: 282,50 KB

Share Result on Facebook

City

Cleveland / Leeds / Pasadena / Wiley / /

Company

A. Atwater Thomas J. Watson Laboratories / AES / Applied Materials / Thin Solid Films / Hiden Analytical Ltd. / National Renewable Energy Laboratory / /

Currency

USD / CRC / /

/

Facility

American Institute of Physics Downloaded / National Renewable Energy Laboratory / California Institute of Technology / American Institute of Physics / /

IndustryTerm

hot-wire chemical vapor deposition / bond dissociation energy / lower electron energy / tunable electron energy / gas-phase reactions / chemical composition / finite electron energy distribution / gas temperature correction / constant activation energy / gas-phase chemistry / fixed electron energy / high temperature activation energy / activation energy / Chemical analysis / energy distribution / gas phase / electron energy / energy / /

Organization

California Institute of Technology / American Institute of Physics Downloaded / American Institute of Physics / /

Person

Jason K. Holt / Maribeth Swiatek / Northrup / David G. Goodwin / /

Position

Model / RT / representative / /

ProgrammingLanguage

K / /

ProvinceOrState

New York / California / /

Technology

spectroscopy / flash / CVD / chemical vapor deposition / /

URL

http /

SocialTag