metal eutectic seal geometry / metal eutectic / mask alignment lithography systems / optical devices / power devices / screen printing techniques / metal seals / metal diffusion seals / Metal self-diffusion rates / metal deposition / upstream and downstream processing / metal seal / memory device / 3D applications / imaging / eutectic metal bonds / metal layers / gas atoms / energy / metal / metal and glass lifetimes / mechanical positioning systems / volume manufacturing / typical alignment applications / dual imaging objectives / metal techniques / backside processing / metal diffusion / metal surfaces / manufacturing / direct bonding technologies / manual systems / metal eutectics / sealed device / metal films / active devices / metal overcoat / simultaneous imaging / metal redistribution layer / inert carrier gas / /
Organization
Applied Force / Suss Drive Waterbury Center / /
Person
S. Farrens / S. Sood / Shari Farrens / H. Ishida / Sumant Sood / Angela Wong / / /
Microsoft Word - SF80904.FINAL.IMAPS.WLP_BalancingDevReqsnMatlsProperties.doc