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Chemistry / Microtechnology / Materials science / Polymers / LIGA / Semiconductor device fabrication / Microelectromechanical systems / Photoresist / Photolithography / SU-8 photoresist / Poly / Resist
Date: 2012-07-31 11:19:10
Chemistry
Microtechnology
Materials science
Polymers
LIGA
Semiconductor device fabrication
Microelectromechanical systems
Photoresist
Photolithography
SU-8 photoresist
Poly
Resist

Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD)

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