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Physics / Electromigration / Power network design / Integrated circuit design / Current density / Reliability / Physical design / EM / Current crowding / Electronic engineering / Electronic design automation / Electromagnetism


White Paper Understand and Avoid Electromigration (EM) & IR-drop in Custom IP Blocks November 2011
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Document Date: 2014-11-07 14:37:36

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Company

Synopsys User Group / Synopsys Inc. / TSMC / Motorola / Taiwan Synopsys Inc. / /

Country

United States / /

IndustryTerm

metal / transistor-level analysis solution / metal wire / reliability analysis solution / metal structures meets power requirements / nanometer technologies / process technology / reduction algorithms / individual metal structures / metal interconnect widths / passive devices / technology trends / metal atoms / metal ions / nanometer process technologies / energy / /

MusicAlbum

EM / /

Person

Gary Chan / Bradley Geden / Gerardin / Jim Black / /

Position

layout editor / Author / general technology trends / conductor / designer / Solutions Architect / Galaxy Custom Designer / scientist / Custom Designer / /

Product

CustomSim reliability analysis solution / CustomSim / /

ProgrammingLanguage

TCL / Joule / DC / /

Technology

semiconductor / reduction algorithms / nanometer process technologies / ASCII / nanometer technologies / simulation / process technology / Nanometer Technology / /

URL

www.synopsys.com / http /

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