Supplementary Material for “Characterization and reduction of microfabrication-induced decoherence in superconducting quantum circuits” C. M. Quintana,1 A. Megrant,1 Z. Chen,1 A. Dunsworth,1 B. Chiaro,1 R. Barends,1 - Electron beam-induced deposition - Document - PDFSEARCH.IO

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	Supplementary Material for “Characterization and reduction of microfabrication-induced decoherence in superconducting quantum circuits” C. M. Quintana,1 A. Megrant,1 Z. Chen,1 A. Dunsworth,1 B. Chiaro,1 R. Barends,1 Add to Reading List Document Date: 2014-08-14 14:18:10 Open Document File Size: 200,09 KB Share Result on Facebook Country United States / / / Facility University of California / / IndustryTerm etched metal / metal / beam energy / chemical cleaning / e-beam / stored inductive energy / electric energy filling factor / lift-off metal sidewall / excess metal / / Organization Department of Physics / University of California / Santa Barbara / / Position JEOL JBX-6300FS electron beam writer / / ProvinceOrState California / / Technology resist-coated chip / lithography / dielectric / / SocialTag Semiconductor device fabrication Science Thin film deposition Physics Electromagnetism Electron beam lithography Focused ion beam Resonator Electron microscope Materials science

Supplementary Material for “Characterization and reduction of microfabrication-induced decoherence in superconducting quantum circuits” C. M. Quintana,1 A. Megrant,1 Z. Chen,1 A. Dunsworth,1 B. Chiaro,1 R. Barends,1 Add to Reading List