Eur. Phys. J. Appl. Phys. 28, 265–[removed]DOI: [removed]epjap:[removed]

Source URL: www.stanford.edu

• Oxides
• Thin film deposition
• Ceramic materials
• Semiconductor device fabrication
• Digital electronics
• Atomic layer deposition
• Hafnium(IV) oxide
• MOSFET
• Equivalent oxide thickness
• Chemistry
• Electromagnetism
• Matter