| Document Date: 2013-11-27 09:43:38
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City Tokyo / Silicon Valley / Grenoble / / Company CEA-Leti Plasma Etching & Stripping Laboratory / Nanoplas / CEA-Leti / / Continent Asia / North America / Europe / / Country France / / / Event Business Partnership / / IndustryTerm plasma-processing tools / dry process solution / sub-20nm node applications / micro and nano solutions / 300mm wafer processing / transistor-formation technologies / plasma process solutions / plasma processing equipment / wet processing / equipment supplier / chemicals / beta site / 14nm manufacturing processes / / Organization Silicon Technology Division / / Person Laurent Malier / Gilles Baujon / Bruce Hokanson / / / Position CEO / / ProvinceOrState California / / Technology semiconductor / MEMS / dielectric / transistor-formation technologies / / URL www.leti.fr / www.nanoplas.eu / /
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News Release Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti High-selectivity dry-etch for 14nm OEM pilot line will replace wet etch; CEA-Leti to qualify the system for addition