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Technology / Nanoimprint lithography / Polycrystalline silicon / Silicon / Wafer / Gas immersion laser doping / Laser / Excimer laser / Ion laser / Chemistry / Semiconductor device fabrication / Materials science


letters to nature .............................................................. Ultrafast and direct imprint of nanostructures in silicon Stephen Y. Chou*, Chris Keimel & Jian Gu
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Document Date: 2006-08-19 16:37:09

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City

Greifswald / Pavia / New York / /

Company

IGG / D. Ab / Keimel & Jian Gu NanoStructure Laboratory / Ge / N. N. Liquid Semiconductors / /

Country

Germany / United States / Italy / /

Currency

GBP / /

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Facility

Princeton University / /

IndustryTerm

metal / photon energy / bipolar transistor fabrication using gas immersion laser doping / silicon using gas immersion laser doping / metal-oxide-semiconductor field-effect transistors / chemical vapour deposition / nanometre-scale devices / lower melting energy / laser energy / /

Organization

Army Research Office / Institut fu¨r Geologische Wissenschaften / office of Naval Research / Princeton University / US Defense Advanced Research Program Agency / /

Person

Stephen Foley / Stephen Y. Chou / Y. Zhan / /

Position

representative / /

ProvinceOrState

New Jersey / New York / /

Technology

semiconductor / radiation / laser / bipolar transistor / semiconductors / dielectric / ATM / lithography / simulation / CVD / integrated circuit / /

URL

www.nature.com/nature / /

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