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Technology / Micro-Opto-Electro-Mechanical Systems / Etching / Mirror / Deep reactive-ion etching / Plasma / Microlens / Dry etching / Reactive-ion etching / Microtechnology / Materials science / Semiconductor device fabrication
Date: 2003-07-09 02:25:14
Technology
Micro-Opto-Electro-Mechanical Systems
Etching
Mirror
Deep reactive-ion etching
Plasma
Microlens
Dry etching
Reactive-ion etching
Microtechnology
Materials science
Semiconductor device fabrication

TIME-MULTIPLEXED-PLASMA-ETCHING OF HIGH NUMERICAL APERTURE PARABOLOIDAL MICROMIRROR ARRAYS Kerwin Wang, Karl F. Böhringer Electrical Engineering Department, University of Washington Seattle, WA[removed]Phone[removed]

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Source URL: www.ee.washington.edu

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