Date: 2003-07-09 02:25:14Technology Micro-Opto-Electro-Mechanical Systems Etching Mirror Deep reactive-ion etching Plasma Microlens Dry etching Reactive-ion etching Microtechnology Materials science Semiconductor device fabrication | | TIME-MULTIPLEXED-PLASMA-ETCHING OF HIGH NUMERICAL APERTURE PARABOLOIDAL MICROMIRROR ARRAYS Kerwin Wang, Karl F. Böhringer Electrical Engineering Department, University of Washington Seattle, WA[removed]Phone[removed]Add to Reading ListSource URL: www.ee.washington.eduDownload Document from Source Website File Size: 2,95 MBShare Document on Facebook
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