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Technology / Micro-Opto-Electro-Mechanical Systems / Etching / Mirror / Deep reactive-ion etching / Plasma / Microlens / Dry etching / Reactive-ion etching / Microtechnology / Materials science / Semiconductor device fabrication


TIME-MULTIPLEXED-PLASMA-ETCHING OF HIGH NUMERICAL APERTURE PARABOLOIDAL MICROMIRROR ARRAYS Kerwin Wang, Karl F. Böhringer Electrical Engineering Department, University of Washington Seattle, WA[removed]Phone[removed]
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Document Date: 2003-07-09 02:25:14


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File Size: 2,95 MB

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Company

Miniaturized Systems / /

Currency

pence / Rs / /

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Facility

University of Washington Seattle / /

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IndustryTerm

gas flow rates / data storage devices / near-field optical applications / micro-opto-electro-mechanical systems / mass production technologies / time-multiplexed plasma-etching technology / physical and chemical etching / /

Organization

University of Washington Seattle / Karl F. Böhringer Electrical Engineering Department / /

Person

Y. C.Lai / V / Washington Seattle / Karl F. Böhringer / /

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Position

candidate for MOEMS applications / Optical Head / read-head / /

Technology

time-multiplexed plasma-etching technology / mass production technologies / /

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