<--- Back to Details
First PageDocument Content
Extreme ultraviolet lithography / Multiple patterning / Resist / Semiconductor device fabrication / Lithography / 32 nanometer / Solid immersion lens / Photolithography / Stepper / Materials science / Technology / Immersion lithography
Date: 2012-09-11 09:28:37
Extreme ultraviolet lithography
Multiple patterning
Resist
Semiconductor device fabrication
Lithography
32 nanometer
Solid immersion lens
Photolithography
Stepper
Materials science
Technology
Immersion lithography

Production Technologies for Mass-production Pioneering Development of Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics has pioneered the development of the immersion lithography technology in order to de

Add to Reading List

Source URL: www.nec.com

Download Document from Source Website

File Size: 736,90 KB

Share Document on Facebook

Similar Documents

FEATURE ARTICLE  www.rsc.org/chemcomm | ChemComm Cheating the diffraction limit: electrodeposited nanowires patterned by photolithography

FEATURE ARTICLE www.rsc.org/chemcomm | ChemComm Cheating the diffraction limit: electrodeposited nanowires patterned by photolithography

DocID: 1rw16 - View Document

2013 a nn ua l rep o r t a nd 2014 prox y chairm an ’ s le t t er  2014

2013 a nn ua l rep o r t a nd 2014 prox y chairm an ’ s le t t er 2014

DocID: 1rsw9 - View Document

Electronic Devices on Various Substrates: Fabrication of Releasable SingleCrystal SiliconMetal Oxide FieldEffect Devices and Their Deterministic Assembly on Foreign Substrates (Adv. Funct. Mater)

Electronic Devices on Various Substrates: Fabrication of Releasable SingleCrystal SiliconMetal Oxide FieldEffect Devices and Their Deterministic Assembly on Foreign Substrates (Adv. Funct. Mater)

DocID: 1rrrV - View Document

creative engineering and manufacturing  UV-LED photolithography exposure system idonus proposes an innovative UV illumination system based on the use of high power LEDs and highgrade Swiss microlens arrays. This product

creative engineering and manufacturing UV-LED photolithography exposure system idonus proposes an innovative UV illumination system based on the use of high power LEDs and highgrade Swiss microlens arrays. This product

DocID: 1re6A - View Document

Article pubs.acs.org/cm Thin Film Receiver Materials for Deterministic Assembly by Transfer Printing Tae-il Kim,*,† Mo Joon Kim,‡ Yei Hwan Jung,§ Hyejin Jang,† Canan Dagdeviren,∥ Hsuan An Pao,∥

Article pubs.acs.org/cm Thin Film Receiver Materials for Deterministic Assembly by Transfer Printing Tae-il Kim,*,† Mo Joon Kim,‡ Yei Hwan Jung,§ Hyejin Jang,† Canan Dagdeviren,∥ Hsuan An Pao,∥

DocID: 1r467 - View Document