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Extreme ultraviolet lithography / Multiple patterning / Resist / Semiconductor device fabrication / Lithography / 32 nanometer / Solid immersion lens / Photolithography / Stepper / Materials science / Technology / Immersion lithography


Production Technologies for Mass-production Pioneering Development of Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics has pioneered the development of the immersion lithography technology in order to de
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Document Date: 2012-09-11 09:28:37


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Company

NEC Electronics Corporation / LSI / Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics / /

Event

Product Issues / /

Facility

NEC Semiconductor Yamagata factory / NEC Semiconductors Yamagata factory / /

IndustryTerm

alkaline development solution / lithography technology / micro-fabrication technology / fabrication technology / 55nm node logic device / lithography technologies / nm logic device / developed technology / manufacturing / exposure technology / requisite element technologies / lithography technology process / double patterning technology / /

Organization

Process Technology Division / Operations Unit / /

Position

Author / Manager / Engineering / Profile UCHIYAMA Takayuki Manager / Engineering / /

Product

pattern shapes / /

Technology

laser / developed technology / Production Technologies / 59 Production Technologies / micro-fabrication technology / also developing lithography technologies / 61 Production Technologies / lithography / lithography technology / fabrication technology / immersion technology / double patterning technology / exposure technology / immersion lithography technology / requisite element technologies / /

URL

http /

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