![Extreme ultraviolet lithography / Multiple patterning / Resist / Semiconductor device fabrication / Lithography / 32 nanometer / Solid immersion lens / Photolithography / Stepper / Materials science / Technology / Immersion lithography Extreme ultraviolet lithography / Multiple patterning / Resist / Semiconductor device fabrication / Lithography / 32 nanometer / Solid immersion lens / Photolithography / Stepper / Materials science / Technology / Immersion lithography](https://www.pdfsearch.io/img/113117b45387f9795034d4ebd9b7b04e.jpg)
| Document Date: 2012-09-11 09:28:37 Open Document File Size: 736,90 KBShare Result on Facebook
Company NEC Electronics Corporation / LSI / Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics / / Event Product Issues / / Facility NEC Semiconductor Yamagata factory / NEC Semiconductors Yamagata factory / / IndustryTerm alkaline development solution / lithography technology / micro-fabrication technology / fabrication technology / 55nm node logic device / lithography technologies / nm logic device / developed technology / manufacturing / exposure technology / requisite element technologies / lithography technology process / double patterning technology / / Organization Process Technology Division / Operations Unit / / Position Author / Manager / Engineering / Profile UCHIYAMA Takayuki Manager / Engineering / / Product pattern shapes / / Technology laser / developed technology / Production Technologies / 59 Production Technologies / micro-fabrication technology / also developing lithography technologies / 61 Production Technologies / lithography / lithography technology / fabrication technology / immersion technology / double patterning technology / exposure technology / immersion lithography technology / requisite element technologies / / URL http /
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