High Performance Low Temperature Metal / Agilent / /
Currency
pence / / /
Facility
Computer Engineering The Hong Kong University of Science / /
IndustryTerm
system-on-panel applications / Electron devices / metal layer / possible solutions / active layer crystalline technology optimization / low-pressure chemical vapor deposition / metal induced crystallization / /
NaturalFeature
Technology Clear Water Bay / /
Organization
Department of Electronic / Hong Kong University of Science and Technology Clear Water Bay / Hoi-Sing Kwok* Center for Display Research / /
Person
A. G. Lewis / Wei Zhou / Sing Kwok / W. Wu / T. J. King / Jacob Ho / /
AMDp2 - 5 High-Performance and Low-Temperature-Compatible Solid Phase Crystallized Polycrystalline Silicon Thin Film Transistors Using Thermal Oxide Buffered Aluminum Oxide as Gate Dielectric