Facilities Program (SHaRE) Oak Ridge National Laboratory / IBM / FEI Co. / JEOL USA Inc. / BESAC Subpanel Review / Nissei-Sanjo America Ltd. / Hitachi / LEO Electron Microscopy Inc. / Philips / Subpanel Review / Materials Science Laboratory / /
Continent
Europe / /
Country
United States / /
Facility
Materials Science Laboratory / /
IndustryTerm
structure imaging / energy spread / elemental and chemical microanalysis / direct structure imaging / aberration-free imaging / strain field imaging / incident energy spread / annular dark field imaging / computer technology / manufacturing tolerances / imaging / chemical reactions / detector systems / real time imaging / experimental tools / in situ applications / spectroscopic imaging / correction hardware / high resolution magnetic imaging / chemical and elemental microanalysis / atomic imaging / /
Organization
Electron Microscopy Center / U. S. Department of Energy / Basic Energy Sciences Advisory Committee / National Laboratory National Center for Electron Microscopy / National Laboratory Center for Microscopy and Microanalysis / National Center for Electron Microscopy / University of illinois / Center for Microcharacterization of Materials / Basic Energy Science Advisory Committee / /
Person
Marc DeGraef / Ian Anderson / Jim Bentley / Eric Van Cappellan / Nestor Zaluzec / Molly McCartney / Frederick Seitz / Ondrej Krivanek / Murray Gibson / J. Murray Gibson / Robert Hull / Jian Min Zuo / John Hutchison / Al Meldrum / John Spence / Mark Kirk / Frances Ross / Nigel Browning / Christian Kisielowski / James Howard / Frank Kahl / Ian Robertson / Bernd Kabius / Matthew Libera / Lawrence Berkeley / Laurie Marks / Larry Allard / Robert Birtcher / Max Haider / Eric Stach / Kenneth Downing / Ulrich Dahmen / Peter Tiemeijer / /
WORKSHOP REPORT ABERRATION CORRECTION IN ELECTRON MICROSCOPY MATERIALS RESEARCH IN AN ABERRATION-FREE ENVIRONMENT