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Photolithography / Semiconductor device fabrication / Photoresist / Resist / Interference lithography / Fraunhofer Society / Ultraviolet / Simulation / Computational lithography / Materials science / Microtechnology / Chemistry
Date: 2015-06-08 13:42:32
Photolithography
Semiconductor device fabrication
Photoresist
Resist
Interference lithography
Fraunhofer Society
Ultraviolet
Simulation
Computational lithography
Materials science
Microtechnology
Chemistry

FRAUNHOFER INSTI TUTE FOR I NTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB General Description Dr.LiTHO is a comprehensive simulation environment for photolithography developed at Fraunhofer IISB. Its main focus is on de

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