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Materials science / Thin film deposition / MOSFET / Chemical vapor deposition / Low-k dielectric / Silicide / Titanium nitride / Metal gate / Copper interconnect / Chemistry / Semiconductor device fabrication / Technology


NANOCHIP Technology Journal EXTENDING COPPER INTERCONNECT
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Document Date: 2014-01-26 17:00:01


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File Size: 2,22 MB

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Company

Maydan Technology Center Group / Thin Film Characterization Laboratory / Nanochip Technology Journal Applied Materials Inc. / Applied Materials Inc. / Mei / Astra / Varian / METAL CAPPING Applied Materials Inc. / 20Å CVD Co / CVD Co Applied Materials Inc. / 15Å CVD Co. / CVD Co METAL / Interconnect Nanochip Technology Journal Applied Materials Inc. / Dielectric Systems / No Cobalt 15Å CVD Co / Modules / Contact Resistivity Nanochip Technology Journal Applied Materials Inc. / CVD Co / /

Country

France / Canada / United States / /

Currency

Rs / /

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Event

Employment Change / /

Facility

University of Illinois / Paul Sabatier University / Babson College / University of Washington / Utah State University / University of Arizona / Simon Fraser University / North Carolina State University / California Institute of Technology / University of Michigan / University of California / National University of Singapore / Rensselaer Polytechnic Institute / Brandeis University / San Jose State University / /

IndustryTerm

logical solution / important manufacturing consideration / Device processing technology / memory devices / disruptive solutions / energy / memory technologies / metal / levels increases manufacturing complexity / mobile devices / manufacturing / test chip / logic devices / rapid thermal processing / imminent solution / gas source / technology innovations / chemical engineering / logic applications / wet clean vs. chemical plasma dry pre-clean / cyclic plasma-enhanced chemical vapor deposition / liner applications / deposition technology / transistor technology / rapid thermal processor / technology manufacturers / chemical / technology node / fabrication technologies / /

Organization

University of Washington / Rensselaer Polytechnic Institute / Utah State University / North Carolina State University / University of California / San Diego / Brandeis University / California Institute of Technology / National University of Singapore / MIT / University of Illinois / Chicago / University of California / Berkeley / Babson College / Chief Technologist office of the Silicon Systems Group / San Jose State University / University of Arizona / the University of Michigan / Simon Fraser University / /

Person

Bencherki Mebarki / Chorng-Ping Chang / Sundar Ramamurthy / Nikos Bekiaris / Alan Ritchie / Jennifer Tseng / Curve / Ismail Emesh / Brendan McDougall / Yee Shek / Chi-Nung Ni / Alexandros Demos / Naushad Variam / Mehul Naik / /

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Position

member of technical staff / director of transistor technology / PVD Applied Producer / integration engineer in the transistor technology group / senior technology program manager / Major / senior process engineer / driver / program manager / technology manager / director of strategic marketing / process applications manager / Vice President / General Manager Metal Deposition Products Silicon Systems Group / director / candidate / technology manager in business unit / /

Product

Centura / /

ProgrammingLanguage

DC / RC / /

ProvinceOrState

British Columbia / Michigan / Utah / California / Arizona / Illinois / /

PublishedMedium

Applied Physics Letters / /

Technology

memory technologies / Dry Cleaning Technology / fabrication technologies / deposition technology / chemical vapor deposition / mobile devices / CMP / Flash / Device processing technology / semiconductor / Adam / lithography / transistor technology / test chip / Laser / rapid thermal processor / rapid thermal processing / radio frequency / Dopant-Segregated Source/Drain Technology / /

URL

www.appliedmaterials.com / /

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