1 Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control Rani S. Ghaida, George Torres, and Puneet Gupta EE Dept., University of California, Los Angeles

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Date: 2010-07-29 18:01:55 Electronic design automation Multiple patterning Extreme ultraviolet lithography 32 nanometer 65 nanometer Standard cell Photoresist Photomask Overlay Control Microtechnology Electronic engineering Materials science		1 Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control Rani S. Ghaida, George Torres, and Puneet Gupta EE Dept., University of California, Los Angeles Add to Reading List Source URL: nanocad.ee.ucla.edu Download Document from Source Website File Size: 1,60 MB Share Document on Facebook

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