Back to Results
First PageMeta Content
Technology / Etching / Plasma processing / Microelectromechanical systems / Tetramethylammonium hydroxide / Buffered oxide etch / Plasma etcher / Plasma etching / Photoresist / Materials science / Semiconductor device fabrication / Microtechnology


Chapter[removed]VLSI Etchants
Add to Reading List

Document Date: 2011-08-05 15:10:22

Open Document

File Size: 142,03 KB

Share Result on Facebook

Company

Transene Company Inc. / /

Currency

CHF / /

IndustryTerm

gas etches / plasma processing / higher etch gas concentrations / titanium etch solution / fresh solutions / etch gas / hydroxide solution / airlock processing / /

NaturalFeature

mT. PSG Hidop High-doped / mT. Sput Tung Sputtered / mT. Sput Ti/W Sputtered / /

Organization

Etch Rate Tests NanoLab Manual Chapter / Bank of England / Stanford / /

Person

Matt Wasilik / Kirt R. Williams / Richard S. Muller / Kishan Gupta / Al Etchant Ti Etchant / /

Position

author / CPA / /

ProvinceOrState

Rhode Island / /

Technology

ATM / Microelectromechanical Systems / /

SocialTag