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Plasma etcher
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1	Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma physics Plasma processing Physics Manufacturing Electromagnetism Reactive-ion etching Plasma Langmuir probe Etching Capacitor Capacitively coupled plasma
2	Compensation for transient chamber wall condition using realtime plasma density feedback control in an inductively coupled plasma etcher Pete I. Klimecky, J. W. Grizzle, and Fred L. Terry, Jr. Department of Electrical En Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma processing Plasma physics Microtechnology Measuring instruments Plasma Reactive-ion etching Langmuir probe Crystal oscillator Etching Microwave Plasma diagnostics
3	Plasma Prep III™ Solid State Low Temperature Asher/Etcher Operation Manual Add to Reading List Source URL: www.2spi.com Language: English - Date: 2011-12-05 16:00:57 Technology Astrophysics Plasma Vacuum ITER Physics Fusion power Fusion reactors
4	NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST Standard Operating Manual ___________________________________________________________ Oxford Plasmalab 80 Plus Plasma Etcher Add to Reading List Source URL: mfz140.ust.hk Language: English - Date: 2014-07-23 02:45:21 Microtechnology Technology Physics Reactive-ion etching Plasma etching Plasma etcher Dry etching Etching Deep reactive-ion etching Semiconductor device fabrication Materials science Plasma processing
5	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2012-11-20 13:15:45 Microtechnology Microelectromechanical systems Wafer Chemical vapor deposition Deep reactive-ion etching Stepper Reactive-ion etching Plasma etcher Sputtering Semiconductor device fabrication Materials science Technology
6	Chapter[removed]VLSI Etchants Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2011-08-05 15:10:22 Technology Etching Plasma processing Microelectromechanical systems Tetramethylammonium hydroxide Buffered oxide etch Plasma etcher Plasma etching Photoresist Materials science Semiconductor device fabrication Microtechnology
7	SiC Etching at the UCSB Nanofabrication Facility Panasonic E640 ICP Etcher Panasonic E640 ICP Etcher • Multi-Purpose ICP etcher Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Microtechnology Etching Aluminium nitride Wafer Plasma processing Semiconductor device fabrication Chemistry Materials science
8	All Active Equipment Sep 4, 2014 5:10 AM Name 4ptprb 4ptprb2 accounting afm2 Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-09-05 08:10:25 Technology Materials science Microelectromechanical systems Lam Research Sputtering Reactive-ion etching Chemical vapor deposition Plasma etcher Tetramethylammonium hydroxide Semiconductor device fabrication Plasma processing Chemistry