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Tetramethylammonium hydroxide
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1	NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST Standard Operating Manual ______________________________________________ Wet Station G: TMAH Anisotropic Silicon Etch, Add to Reading List Source URL: mfz140.ust.hk Language: English - Date: 2014-09-24 23:25:14 Microtechnology Tetramethylammonium hydroxide Semiconductor device fabrication Etching Photoresist Glove Rinse Personal protective equipment Chemistry Materials science Clothing
2	Microsoft PowerPoint - for nsf high school students.ppt Add to Reading List Source URL: cba.mit.edu Language: English - Date: 2011-12-13 18:50:30 Chemistry Technology Etching Tetramethylammonium hydroxide Carbon nanotube Wafer Thermal oxidation Photoresist Microelectromechanical systems Materials science Semiconductor device fabrication Microtechnology
3	Open Research Online The Open University’s repository of research publications and other research outputs Thermochemolysis of organic matter preserved in stalagmites: a preliminary study Journal Article Add to Reading List Source URL: oro.open.ac.uk Language: English - Date: 2012-10-25 02:24:37 Tetramethylammonium hydroxide Functional groups Lignin Speleothem Benzoic acid Methyl group Organic matter Methanol Chemistry Organic chemistry Papermaking
4	Chapter 2.4 msink4 Operation (msink4[removed] Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-08-06 10:07:02 Etching Technology Tetramethylammonium hydroxide Microelectromechanical systems Bulk micromachining Photoresist Potassium hydroxide Glass etching Industrial etching Chemistry Materials science Microtechnology
5	Chapter[removed]Miscellaneous Etchants Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2010-09-17 15:08:49 Mineral acids Microtechnology Buffered oxide etch Ethylenediamine pyrocatechol Tetramethylammonium hydroxide Hydrogen chloride Industrial etching Nitric acid Iron(III) chloride Chemistry Etching Chlorides
6	Chapter[removed]VLSI Etchants Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2011-08-05 15:10:22 Technology Etching Plasma processing Microelectromechanical systems Tetramethylammonium hydroxide Buffered oxide etch Plasma etcher Plasma etching Photoresist Materials science Semiconductor device fabrication Microtechnology
7	P R O D U C T B U L L E T I N AZ® nLOFTM 2000 Photoresist Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:48 Optical materials Microtechnology Polymers Photoresist Resist Lift-off Tetramethylammonium hydroxide Wafer Poly Chemistry Materials science Semiconductor device fabrication
8	D A T A S H E E T ® AZ 300 MIF Developer Description Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Photoresist Tetramethylammonium hydroxide Resist Spray Wafer Photographic developer Semiconductor device fabrication Chemistry Materials science
9	MCC PMGI RESISTS OFFER NANO P M G I Resists • Sub 0.25µm lift-off processing Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Semiconductor device fabrication Technology Resist Photoresist Spin coating Lift-off Microelectromechanical systems Tetramethylammonium hydroxide Poly Materials science Chemistry Microtechnology
10	All Active Equipment Sep 4, 2014 5:10 AM Name 4ptprb 4ptprb2 accounting afm2 Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-09-05 08:10:25 Technology Materials science Microelectromechanical systems Lam Research Sputtering Reactive-ion etching Chemical vapor deposition Plasma etcher Tetramethylammonium hydroxide Semiconductor device fabrication Plasma processing Chemistry