Tetramethylammonium

Results: 14



#Item
1II-VI semiconductors / Nanomaterials / Mineralogy / Perovskite / Solar power / Nanocrystal / Cadmium selenide / Zinc oxide / Light-emitting diode / Tetramethylammonium

Highly Efficient Perovskite Nanocrystal Light‐Emitting Diodes Enabled by a Universal Crosslinking Method

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Source URL: liu.diva-portal.org

Language: English - Date: 2016-07-07 06:23:23
2Microtechnology / Tetramethylammonium hydroxide / Semiconductor device fabrication / Etching / Photoresist / Glove / Rinse / Personal protective equipment / Chemistry / Materials science / Clothing

NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ______________________________________________ Wet Station G: TMAH Anisotropic Silicon Etch,

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Source URL: mfz140.ust.hk

Language: English - Date: 2014-09-24 23:25:14
3Chemistry / Technology / Etching / Tetramethylammonium hydroxide / Carbon nanotube / Wafer / Thermal oxidation / Photoresist / Microelectromechanical systems / Materials science / Semiconductor device fabrication / Microtechnology

Microsoft PowerPoint - for nsf high school students.ppt

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Source URL: cba.mit.edu

Language: English - Date: 2011-12-13 18:50:30
4Tetramethylammonium hydroxide / Functional groups / Lignin / Speleothem / Benzoic acid / Methyl group / Organic matter / Methanol / Chemistry / Organic chemistry / Papermaking

Open Research Online The Open University’s repository of research publications and other research outputs Thermochemolysis of organic matter preserved in stalagmites: a preliminary study Journal Article

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Source URL: oro.open.ac.uk

Language: English - Date: 2012-10-25 02:24:37
5Etching / Technology / Tetramethylammonium hydroxide / Microelectromechanical systems / Bulk micromachining / Photoresist / Potassium hydroxide / Glass etching / Industrial etching / Chemistry / Materials science / Microtechnology

Chapter 2.4 msink4 Operation (msink4[removed]

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Source URL: nanolab.berkeley.edu

Language: English - Date: 2014-08-06 10:07:02
6Mineral acids / Microtechnology / Buffered oxide etch / Ethylenediamine pyrocatechol / Tetramethylammonium hydroxide / Hydrogen chloride / Industrial etching / Nitric acid / Iron(III) chloride / Chemistry / Etching / Chlorides

Chapter[removed]Miscellaneous Etchants

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Source URL: nanolab.berkeley.edu

Language: English - Date: 2010-09-17 15:08:49
7Technology / Etching / Plasma processing / Microelectromechanical systems / Tetramethylammonium hydroxide / Buffered oxide etch / Plasma etcher / Plasma etching / Photoresist / Materials science / Semiconductor device fabrication / Microtechnology

Chapter[removed]VLSI Etchants

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Source URL: nanolab.berkeley.edu

Language: English - Date: 2011-08-05 15:10:22
8Optical materials / Microtechnology / Polymers / Photoresist / Resist / Lift-off / Tetramethylammonium hydroxide / Wafer / Poly / Chemistry / Materials science / Semiconductor device fabrication

P R O D U C T B U L L E T I N AZ® nLOFTM 2000 Photoresist

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Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:10:48
9Photoresist / Tetramethylammonium hydroxide / Resist / Spray / Wafer / Photographic developer / Semiconductor device fabrication / Chemistry / Materials science

D A T A S H E E T ® AZ 300 MIF Developer Description

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Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:10:49
10Semiconductor device fabrication / Technology / Resist / Photoresist / Spin coating / Lift-off / Microelectromechanical systems / Tetramethylammonium hydroxide / Poly / Materials science / Chemistry / Microtechnology

MCC PMGI RESISTS OFFER NANO P M G I Resists • Sub 0.25µm lift-off processing

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Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:10:49
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